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Characteristics of Single Crystalline Rutile GeO2 Film Grown on Sapphire by Chemical Vapor Deposition with a high growth rate ∼2.2 µm/hr
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F. Golbasi Et Al. , "Characteristics of Single Crystalline Rutile GeO2 Film Grown on Sapphire by Chemical Vapor Deposition with a high growth rate ∼2.2 µm/hr," Journal of Alloys and Compounds , vol.1014, 2025

Golbasi, F. Et Al. 2025. Characteristics of Single Crystalline Rutile GeO2 Film Grown on Sapphire by Chemical Vapor Deposition with a high growth rate ∼2.2 µm/hr. Journal of Alloys and Compounds , vol.1014 .

Golbasi, F., Liu, B., Hwang, J., & AKYOL, F., (2025). Characteristics of Single Crystalline Rutile GeO2 Film Grown on Sapphire by Chemical Vapor Deposition with a high growth rate ∼2.2 µm/hr. Journal of Alloys and Compounds , vol.1014.

Golbasi, Fatma Et Al. "Characteristics of Single Crystalline Rutile GeO2 Film Grown on Sapphire by Chemical Vapor Deposition with a high growth rate ∼2.2 µm/hr," Journal of Alloys and Compounds , vol.1014, 2025

Golbasi, Fatma Et Al. "Characteristics of Single Crystalline Rutile GeO2 Film Grown on Sapphire by Chemical Vapor Deposition with a high growth rate ∼2.2 µm/hr." Journal of Alloys and Compounds , vol.1014, 2025

Golbasi, F. Et Al. (2025) . "Characteristics of Single Crystalline Rutile GeO2 Film Grown on Sapphire by Chemical Vapor Deposition with a high growth rate ∼2.2 µm/hr." Journal of Alloys and Compounds , vol.1014.

@article{article, author={Fatma Golbasi Et Al. }, title={Characteristics of Single Crystalline Rutile GeO2 Film Grown on Sapphire by Chemical Vapor Deposition with a high growth rate ∼2.2 µm/hr}, journal={Journal of Alloys and Compounds}, year=2025}