Internal growth parameters - a suitable basis for comparison of PVD coatings


MITTERER C., MAYRHOFER P., Kelesoglu E. , WIEDEMANN R., OETTEL H.

ZEITSCHRIFT FUR METALLKUNDE, cilt.90, ss.602-607, 1999 (SCI İndekslerine Giren Dergi) identifier identifier

  • Cilt numarası: 90 Konu: 8
  • Basım Tarihi: 1999
  • Dergi Adı: ZEITSCHRIFT FUR METALLKUNDE
  • Sayfa Sayıları: ss.602-607

Özet

Thin hard coatings deposited by physical vapour deposition (-PVD) techniques are widely used to reduce wear and corrosion nf tools and engineering components Corresponding to the broad range of different modifications of PVD methods, the broad range of different modifications of PVD methods, results published on the interrelationships between process parameters and resulting microstructure and properties are not always comparable since system-depending process parameters are often used to describe the growth conditions. System-independent growth parameters like particle energy or flux density may serve as a basis for the comparison of coatings deposited employing different deposition machines and techniques. The aim of this work is to verify the concept of system-independent parameters using different sputtering systems and the coating systems TiN and TiB2.