Materials Sciences and Applications, vol.4, pp.794-801, 2013 (Refereed Journals of Other Institutions)
Self inversion issue and excess capacitance phenomenon were observed for the first time in relatively thick silicon dioxide (SiO2) in the form of MOS (metal(Al)/SiO2/p type crystalline silicon) structure. Both phenomena were based on
minority carriers (electrons in this case) and studied through DC current-applied bias voltage (I-V) and AC admittance
measurements in dark/light condition as a function of ambient temperature (295 - 380 K). Either of the cases was the
departure of traditional MOS analysis, manifesting themselves in the inversion regime of MOS diode. Increase in frequency/temperature/light intensity within dark and light conditions led to weaken the maxima of hump in C-V curves
and finally turned into deep depletion mode after exceeding threshold value of frequency/temperature/light intensity. In
resumed conditions, supplementary I-V measurements were carried out to describe the generation and conduction
mechanism(s) for minority carriers (electrons).